Zweidimensionaler photonischer Kristall und Herstellungsverfahren

Two-dimensional photonic crystal slab apparatus (10, 40, 50) and a method for fabricating two-dimensional photonic crystal slab apparatus (10, 40, 50). A two-dimensional photonic crystal slab apparatus (10, 40, 50) has a photonic crystal slab (20, 70, 110) containing a two-dimensional periodic latti...

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Bibliographische Detailangaben
Hauptverfasser: SIGALAS, MIHAIL M, GROT, ANNETTE, FLORY, CURT, MIRKARIMI, LAURA W
Format: Patent
Sprache:ger
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Zusammenfassung:Two-dimensional photonic crystal slab apparatus (10, 40, 50) and a method for fabricating two-dimensional photonic crystal slab apparatus (10, 40, 50). A two-dimensional photonic crystal slab apparatus (10, 40, 50) has a photonic crystal slab (20, 70, 110) containing a two-dimensional periodic lattice, and upper and lower cladding layers (26, 28, 80, 82, 74, 76, 105, 116, 103, 112) for the photonic crystal slab (20, 70, 110), the upper and lower cladding layers (26, 28, 80, 82, 74, 76, 105, 116, 103, 112) each including a metallic cladding layer (30, 32, 82, 76, 116, 112). The metallic cladding layers (30, 32, 82, 76, 116, 112) permit achieving substantially perfect light transmission through a waveguide (42, 52) in the slab (20, 70, 110), even when the waveguide (52) is strongly bent. The fabrication method has steps of forming a two-dimensional photonic crystal slab (20, 70, 110) from a dielectric slab (62, 96, 106) supported on a substrate (66, 92) by, for example, an etch process.