Lithographischer Projektionsapparat und lithographisches Verfahren zur Herstellung einer Vorrichtung

A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern M...

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Bibliographische Detailangaben
Hauptverfasser:	LOOPSTRA, ERIK ROELOF, RENKENS, MICHAEL JOZEFA MATHIJS, BANINE, VADIM YEVGENYEVICH, BENSCHOP, JOZEF PETRUS HENRICUS, NOORDMAN, OSCAR FRANSISCUS JOZEPHUS, VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS, MOORS, JOHANNES HUBERTUS JOSEPHINA
Format:	Patent
Sprache:	ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern MA, a substrate table WT for holding a substrate and a projection system PL for projecting the patterned beam PB onto a target portion C of the substrate W, wherein the lithographic projection apparatus further comprises a sensor MM for measuring a movement of the projection beam PB perpendicular to its propagation direction and a controller CM to control a received dose of said projection beam PM on a target portion C of the substrate W in response to an output from said sensor MM.