Process for the simultaneous utilisation of halogenated and basic residues

The object of the invention is to ensure the conversion of halogen-containing residues in the gasification process and simultaneously to make possible utilisation of basic residues. The halogen-containing residues are to be converted into usable gas, the basic residues are to be exploited usefully a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	RABE, WOLFGANG., O-7702 BERNSDORF, DE, GROESCHEL, LUTZ., O-7700 HOYERSWERDA, DE, DUERLICH, MANFRED., O-7700 HOYERSWERDA, DE, SCHROEDER, HORST., O-7700 HOYERSWERDA, DE
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	CARBURETTING AIR OR OTHER GASES CHEMICAL MATERIALS FOR USE IN BREATHING APPARATUS CHEMICAL MEANS FOR EXTINGUISHING FIRES OR FOR COMBATING ORPROTECTING AGAINST HARMFUL CHEMICAL AGENTS CHEMISTRY DISPOSAL OF SOLID WASTE FIRE-FIGHTING FUELS HUMAN NECESSITIES LIFE-SAVING LUBRICANTS METALLURGY PEAT PERFORMING OPERATIONS PETROLEUM, GAS OR COKE INDUSTRIES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PRODUCTION OF PRODUCER GAS, WATER-GAS, SYNTHESIS GAS FROMSOLID CARBONACEOUS MATERIAL, OR MIXTURES CONTAINING THESE GASES PURIFYING OR MODIFYING THE CHEMICAL COMPOSITION OF COMBUSTIBLEGASES CONTAINING CARBON MONOXIDE RECLAMATION OF CONTAMINATED SOIL RECLAMATION OF CONTAMINED SOIL SOIL SEPARATION TECHNICAL GASES CONTAINING CARBON MONOXIDE TRANSPORTING
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Beschreibung
Zusammenfassung:	The object of the invention is to ensure the conversion of halogen-containing residues in the gasification process and simultaneously to make possible utilisation of basic residues. The halogen-containing residues are to be converted into usable gas, the basic residues are to be exploited usefully and the resulting halogen compounds are to be neutral or weakly basic. Halogenated residues are converted into usable gas in a suspension flow or fixed bed gasifier. The hydrogen halides are neutralised from the usable gas with quench water to which basic residues and/or compounds were added prior to the scrubbing process. The basic residues can also be added to the starting material upstream of the gasification reactor. The amount of the basic substances added is dependent on the halogen content and the amount of residues used. The area of application of the invention is gasification, in particular fixed bed or suspension flow gasification for the purpose of disposal of halogen-containing and basic residues and waste substances.