Positive photosensitive lacquer-resistant to plasma etching - comprises selected 1,2-naphtho:quinone-2-di:azide, phenol¨ resin, silicon-contg. substd. benzoic acid and solvent

Lacquers acting as single-layer resists or as the top layer for two-layered systems, comprise a 1,2-naphthoquinone-2-diazide deriv., a phenol resin, an Si-contg. substd. benzoic acid and a solvent or solvent mixt. where the 1,2-naphthoquinone diazide deriv. comprises a cpd. of general formula (I) or...

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Hauptverfasser: BRANDSTAEDTER, HERMANN, O-1193 BERLIN, DE, MEHLISS, GEORG, O-1055 BERLIN, DE, RENGER, ELFRIEDE, O-1170 BERLIN, DE, ABRAHAM, WERNER., O-1403 BIRKENWERDER, DE, LUDWIG, IRIS, O-1195 BERLIN, DE, CSONGAR, CHRISTIAN., O-1092 BERLIN, DE, BUCHALLIK, MATHIAS, O-1254 SCHOENEICHE, DE
Format: Patent
Sprache:eng ; ger
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Zusammenfassung:Lacquers acting as single-layer resists or as the top layer for two-layered systems, comprise a 1,2-naphthoquinone-2-diazide deriv., a phenol resin, an Si-contg. substd. benzoic acid and a solvent or solvent mixt. where the 1,2-naphthoquinone diazide deriv. comprises a cpd. of general formula (I) or (II) as well as a benzoic acid of general formula (III), and the amt. of the Si-contg. formula (III), and the amt. of the Si-contg. benzoic acid comprises 10-100 wt.% of the total wt. In the formula, a gp. of formula (IV). R= alkyl, and n= 0, 1 or 2. Compsn. is pref. 5-tris-(trimethyl silyloxy)-silyloxy -1,2-naphthoquinone- 2-diazide together with tris-(trimethylsilyl -methylbenzoic acid are used. USE/ADVANTAGE - Useful in photocopier lacquers (claimed) giving resistance to oxygen plasma, good compatibility with the photolacquer component and no impairment of the lithographic parameters of the photocopier lacquer. (4pp Dwg.No.0/0)