Method for controlling a vacuum arc discharge
The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The i...
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| creator | SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD |
| description | The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The invention is based on the object of finding a method which minimises droplet formation and increases cathode material utilisation by reliably controlling the movement of the focus spot on the cathode. The object is achieved according to the invention by the voltage between the anode and cathode being applied in a pulsating manner and a laser pulse being aimed onto the cathode surface, in a defined location, in each case at maximum voltage. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE3901401A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE3901401A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE3901401A13</originalsourceid><addsrcrecordid>eNrjZND1TS3JyE9RSMsvUkjOzyspys_JycxLV0hUKEtMLi3NVUgsSlZIySxOzkgsSk_lYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxLq7GlgaGJgaGjobGRCgBAF5RKW0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method for controlling a vacuum arc discharge</title><source>esp@cenet</source><creator>SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD ; WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD ; SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD ; SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD ; STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD ; POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD ; FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD</creator><creatorcontrib>SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD ; WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD ; SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD ; SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD ; STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD ; POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD ; FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD</creatorcontrib><description>The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The invention is based on the object of finding a method which minimises droplet formation and increases cathode material utilisation by reliably controlling the movement of the focus spot on the cathode. The object is achieved according to the invention by the voltage between the anode and cathode being applied in a pulsating manner and a laser pulse being aimed onto the cathode surface, in a defined location, in each case at maximum voltage.</description><language>eng ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890914&DB=EPODOC&CC=DE&NR=3901401A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890914&DB=EPODOC&CC=DE&NR=3901401A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD</creatorcontrib><creatorcontrib>WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD</creatorcontrib><creatorcontrib>SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD</creatorcontrib><creatorcontrib>SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD</creatorcontrib><creatorcontrib>STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD</creatorcontrib><creatorcontrib>POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD</creatorcontrib><creatorcontrib>FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD</creatorcontrib><title>Method for controlling a vacuum arc discharge</title><description>The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The invention is based on the object of finding a method which minimises droplet formation and increases cathode material utilisation by reliably controlling the movement of the focus spot on the cathode. The object is achieved according to the invention by the voltage between the anode and cathode being applied in a pulsating manner and a laser pulse being aimed onto the cathode surface, in a defined location, in each case at maximum voltage.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1989</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND1TS3JyE9RSMsvUkjOzyspys_JycxLV0hUKEtMLi3NVUgsSlZIySxOzkgsSk_lYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxLq7GlgaGJgaGjobGRCgBAF5RKW0</recordid><startdate>19890914</startdate><enddate>19890914</enddate><creator>SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD</creator><creator>WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD</creator><creator>SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD</creator><creator>SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD</creator><creator>STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD</creator><creator>POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD</creator><creator>FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD</creator><scope>EVB</scope></search><sort><creationdate>19890914</creationdate><title>Method for controlling a vacuum arc discharge</title><author>SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD ; WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD ; SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD ; SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD ; STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD ; POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD ; FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE3901401A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; ger</language><creationdate>1989</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD</creatorcontrib><creatorcontrib>WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD</creatorcontrib><creatorcontrib>SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD</creatorcontrib><creatorcontrib>SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD</creatorcontrib><creatorcontrib>STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD</creatorcontrib><creatorcontrib>POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD</creatorcontrib><creatorcontrib>FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD</au><au>WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD</au><au>SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD</au><au>SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD</au><au>STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD</au><au>POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD</au><au>FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for controlling a vacuum arc discharge</title><date>1989-09-14</date><risdate>1989</risdate><abstract>The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The invention is based on the object of finding a method which minimises droplet formation and increases cathode material utilisation by reliably controlling the movement of the focus spot on the cathode. The object is achieved according to the invention by the voltage between the anode and cathode being applied in a pulsating manner and a laser pulse being aimed onto the cathode surface, in a defined location, in each case at maximum voltage.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Method for controlling a vacuum arc discharge |
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