Method for controlling a vacuum arc discharge

The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The i...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SCHULZE, DIETMAR., DDR 8060 DRESDEN, DD, WILBERG, RUEDIGER., DDR 8019 DRESDEN, DD, SIEMROTH, PETER.NAT., DDR 1040 BERLIN, DD, SCHEIBE, HANS-JOACHIM.NAT., DDR 8021 DRESDEN, DD, STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD, POMPE, WOLFGANG, DR.SC.NAT., DDR 8027 DRESDEN, DD, FLEISCHER, WERNER.., DDR 8036 DRESDEN, DD
Format: Patent
Sprache:eng ; ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The invention is based on the object of finding a method which minimises droplet formation and increases cathode material utilisation by reliably controlling the movement of the focus spot on the cathode. The object is achieved according to the invention by the voltage between the anode and cathode being applied in a pulsating manner and a laser pulse being aimed onto the cathode surface, in a defined location, in each case at maximum voltage.