POSITIV ARBEITENDES STRAHLUNGSEMPFINDLICHES GEMISCH UND DARAUS HERGESTELLTES STRAHLUNGSEMPFINDLICHES AUFZEICHNUNGSMATERIAL

A proposed positive-working radiation-sensitive composition contains a compound which forms an acid when exposed to actinic radiation and a compound which is acid-cleavable and is characterised in that the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone com...

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Bibliographische Detailangaben
1. Verfasser:	DOESSEL,KARL-FRIEDRICH,.DR
Format:	Patent
Sprache:	ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A proposed positive-working radiation-sensitive composition contains a compound which forms an acid when exposed to actinic radiation and a compound which is acid-cleavable and is characterised in that the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a development solubility of 0.1 to 100 g/l and a boiling point of over 150 DEG C. The claimed composition does not exhibit varying development properties even with varying "holding times" and therefore has a large processing latitude and makes possible a high structural resolution.