Verfahren und Vorrichtung für Photolackverarbeitung

Ultraviolet radiation process applies to manufacture semiconductor devices in order to enhance the thermal stability of the photoresist film on semiconductor wafers.A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatment of the photoresist employi...

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Bibliographische Detailangaben
Hauptverfasser:	SUZUKI, SHINJI, YOKOHAMA-SHI KANAGAWA-KEN, JP, SUZUKI, HIROKO, YOKOHAMA-SHI KANAGAWA-KEN, JP, UEKI, KAZUYOSHI, YOKOHAMA-SHI KANAGAWA-KEN, JP, OHNO, KUNIHARU, YOKOHAMA-SHI KANAGAWA-KEN, JP, MIMURA, YOSHIKI, YOKOHAMA-SHI KANAGAWA-KEN, JP, TANAKA, KAZUYA, YOKOHAMA-SHI KANAGAWA-KEN, JP, SUGIOKA, SHINJI, YOKOHAMA-SHI KANAGAWA-KEN, JP, ARAI, TESUJI, YOKOHAMA-SHI KANAGAWA-KEN, JP
Format:	Patent
Sprache:	ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Ultraviolet radiation process applies to manufacture semiconductor devices in order to enhance the thermal stability of the photoresist film on semiconductor wafers.A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatment of the photoresist employing ultraviolet irradiation by preventing the deformation of the photoresist which is caused by the light radiated from a discharge lamp such as high pressure mercury vapor lamp. These method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the photoresist, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the photoresist out of radiant lights obtained from the discharge lamp.