VERFAHREN ZUR ABBILDENDEN LASERINTERFEROMETRIE UND LASERINTERFEROMETER ZUR DURCHFUEHRUNG DES VERFAHRENS

PCT No. PCT/DE87/00002 Sec. 371 Date Sep. 9, 1987 Sec. 102(e) Date Sep. 9, 1987 PCT Filed Jan. 8, 1987 PCT Pub. No. WO87/04237 PCT Pub. Date Jul. 16, 1987.The present invention relates to a laserinterferometric process, in particular, for use in etching thin layers, whereby a layer to be examined is radiated with a laser passing over a surface of the layer and the intensity of the reflected laser beam, which is composed of a beam reflected from the surface of the layer to be examined and one reflected from its lower interface is ascertained and evaluated by a data processing system from which the information concerning the layer to be examined is read out. The present invention also relates to an imaging laserinterferometer comprising a modulator, which deflects the laser beam, a detector for the reflected laser beam and a data processing systen, which analyzes the detector signals.