DE3503398

PCT No. PCT/EP86/00045 Sec. 371 Date Sep. 30, 1986 Sec. 102(e) Date Sep. 30, 1986 PCT Filed Jan. 31, 1986 PCT Pub. No. WO86/04616 PCT Pub. Date Aug. 14, 1986.Sputtering apparatus for the reactive coating of substrates with hard substances, which has a housing (1) with a feed line (3, 4) for a reacti...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HERKLOTZ, GUENTER., 6454 BRUCHKOEBEL, DE, ELIGEHAUSEN, HANS. DR., 6450 HANAU, DE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!