DE3503398

PCT No. PCT/EP86/00045 Sec. 371 Date Sep. 30, 1986 Sec. 102(e) Date Sep. 30, 1986 PCT Filed Jan. 31, 1986 PCT Pub. No. WO86/04616 PCT Pub. Date Aug. 14, 1986.Sputtering apparatus for the reactive coating of substrates with hard substances, which has a housing (1) with a feed line (3, 4) for a reacti...

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Hauptverfasser: HERKLOTZ, GUENTER., 6454 BRUCHKOEBEL, DE, ELIGEHAUSEN, HANS. DR., 6450 HANAU, DE
Format: Patent
Sprache:eng
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Zusammenfassung:PCT No. PCT/EP86/00045 Sec. 371 Date Sep. 30, 1986 Sec. 102(e) Date Sep. 30, 1986 PCT Filed Jan. 31, 1986 PCT Pub. No. WO86/04616 PCT Pub. Date Aug. 14, 1986.Sputtering apparatus for the reactive coating of substrates with hard substances, which has a housing (1) with a feed line (3, 4) for a reaction gas a nobble gas, a magnetron (6) as well as at least one mounting (9) for the substrates, the mounting (9) being positionable in front of the sputtering surface and between an ionization system with at least two electrodes (7, 8), of which the one electrode (8) is operable as an electron emitter and the other electrode (7) is at a positive potential with respect to the emitter electrode, and the substrate mounting (9) itself is at a negative voltage in relation to the ground.