Vapour-deposition material for achieving extremely high vapour-deposition rates

The invention relates to a vapour-deposition material comprising a mixture of Si and SiO2 to achieve extremely high vapour-deposition rates in the production of SiO layers in vacuo. SiO layers are used, for example, as interference layers or protective layers in the surface-finishing of glasses or o...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	SZYMANSKI,ULRICH, SCHICHT,HEINZ,.DR, LAMBRECHT,DIETER, AMBROSCH,WERNER, FISCHER,MONIKA,.ACKERMANN,GEB, GOTTWALD,HEINER,-MIN, ENGEMANN,WOLFGANG, KRUEGER,MANFRED,.DR, HILDEBRAND,HAGEN,-MIN, BECKER,HANS,.DR
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY METALLURGY NON-METALLIC ELEMENTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention relates to a vapour-deposition material comprising a mixture of Si and SiO2 to achieve extremely high vapour-deposition rates in the production of SiO layers in vacuo. SiO layers are used, for example, as interference layers or protective layers in the surface-finishing of glasses or of electronic components. The object is achieved according to the invention by the SiO2 containing strongly hydrogen bridge-bound silanol groups which absorb in the wave number region of 930...970 cm.