VERFAHREN ZUM HERSTELLEN EINER IMPLANTIERBAREN ELEKTRODE
In a method for manufacturing an implantable electrode, particularly a stimulating electrode, vitreous carbon is sputtered from a vitreous carbon target on at least a part of the surface of the electrode. The sputtering is performed in an argon atmosphere at a pressure of 4 to 8x10-2 mbar and at a v...
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Zusammenfassung: | In a method for manufacturing an implantable electrode, particularly a stimulating electrode, vitreous carbon is sputtered from a vitreous carbon target on at least a part of the surface of the electrode. The sputtering is performed in an argon atmosphere at a pressure of 4 to 8x10-2 mbar and at a voltage of 1.6 to 2.4 kV. The electrode may consist essentially of platinum-iridium, vitreous carbon or platinum. |
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