DE3216043

An electrophotographic photosensitive material having a long lifetime can be provided by forming an amorphous silicon layer having a thickness of 0.01-0.08 mu m on the photoconductive layer on the electrically conductive substrate in the said material without changing the characteristics of the phot...

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Hauptverfasser: ONUMA, SHIGEHARU, HITACHI, JP, KAKUTA, ATSUSHI, HITACHIOTA, JP, MORI, YASUKI, HITACHI, JP, MORISHITA, HIROSADA, HITACHI, JP, SUZUKI, KATSUHITO, MITO, JP, TAMAHASHI, KUNIHIRO, HOSOYA, AKIRA
Format: Patent
Sprache:eng
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Zusammenfassung:An electrophotographic photosensitive material having a long lifetime can be provided by forming an amorphous silicon layer having a thickness of 0.01-0.08 mu m on the photoconductive layer on the electrically conductive substrate in the said material without changing the characteristics of the photoconductive layer.