Low-fuming, free-flowing fluxes for sherardising

Low-fuming, free-flowing fluxes for sherardising contain from 50 to 90% by weight of alkali metal chlorides and from 10 to 50% by weight of ammonium chloride. In addition they contain, based on the ammonium chloride and alkali metal chloride content, from 0.1 to 1% by weight of magnesium oxide and s...

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Bibliographische Detailangaben
Hauptverfasser:	GIESLER,ERICH,.DR, VOELKL,ERFRIED,.DR, APPL,MAX,.DR
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Low-fuming, free-flowing fluxes for sherardising contain from 50 to 90% by weight of alkali metal chlorides and from 10 to 50% by weight of ammonium chloride. In addition they contain, based on the ammonium chloride and alkali metal chloride content, from 0.1 to 1% by weight of magnesium oxide and so much zinc chloride, that the weight ratio of magnesium oxide to zinc chloride is from 1 : 2 to 1 : 10.