Washing liq. for cleaning printed circuit surface - contains xylene, glycol mono:butyl ether, isobutanol and opt. toluene and (m)ethanol

A washing liq. consisting of xylene (I), glycol monobutyl ether (II), and isobutanol (III), is used for cleaning circuit surfaces coated with a resin-, rosin- or aminoalcohol-based flux, remaining after soldering. The mixts. have flash points >21 degrees C and can be used in a brush roller cleani...

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1. Verfasser: KUENZIG,HERBERT
Format: Patent
Sprache:eng ; ger
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Zusammenfassung:A washing liq. consisting of xylene (I), glycol monobutyl ether (II), and isobutanol (III), is used for cleaning circuit surfaces coated with a resin-, rosin- or aminoalcohol-based flux, remaining after soldering. The mixts. have flash points >21 degrees C and can be used in a brush roller cleaning machine. A pref. washing liq. mixt., having flash point 24-26 degrees C, contains, by vol., 30% (I), 32.5% (II) and 37.5% (III). (I) may be replaced, opt. entirely, by toluene, and (III) by EtOH and/or MeOH, but these exchanges result in a lowered flash point.