Oxidising and doping silicon surfaces

Process for oxidising and doping silicon surfaces by electrochemical treatment is claimed in which the non-metal substrate is anodically treated using a (plasma)chemical process with spark discharge in a molten salt using a monopolar impulse voltage of 2-500 Hz at an average current density of 0.02-...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KRYSMANN, WALDEMAR.NAT, HOENICKE, DIETER, DR
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SEMICONDUCTOR DEVICES
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