Diamantähnliche Beschichtung

A process is disclosed for generating a wear-resistant, diamond-like coating on a substrate (1), as well as a wearing part provided with such a coating, for example in a textile machine. Although the diamond-like coating is quickly and economically produced, it adheres well to the substrate. A unifo...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	DURST, GUENTHER, 72664 KOHLBERG, DE, SELLSCHOPP, MICHAEL., 72076 TUEBINGEN, DE, KRALL, STEFAN, 73105 DUERNAU, DE
Format:	Patent
Sprache:	ger
Schlagworte:	BRAIDING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONVEYING DIFFUSION TREATMENT OF METALLIC MATERIAL HANDLING THIN OR FILAMENTARY MATERIAL HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS,CABLES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL KNITTING LACE-MAKING METALLURGY NON-WOVEN FABRICS PACKING PERFORMING OPERATIONS STORING SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TEXTILES TRANSPORTING TRIMMINGS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A process is disclosed for generating a wear-resistant, diamond-like coating on a substrate (1), as well as a wearing part provided with such a coating, for example in a textile machine. Although the diamond-like coating is quickly and economically produced, it adheres well to the substrate. A uniform quality over the area exposed to wear is obtained with this process, as well as a wearing part provided with this coating. In a plasma-enhanced chemical vapour deposition process of the coating layer from a gaseous atmosphere in a reaction chamber (5), the deposition atmosphere is excited by electromagnetic radiation, and an electric bias voltage is generated between the substrate (1) and at least one ground electrode (6, 51). The disclosed process is characterised in that the substrates (1) are arranged in such a way that as many as possible of the field lines (4) between the substrate and the ground electrodes perpendicularly cross the surface (3) spanned by the arrangement of the substrates or the field lines (4) extend perpendicularly to the spanning surface at the end closest to the spanning surface (3).