Verfahren zur genauen Positionsmessung

A method of position measurement is carried out with a device in which two scales (M1, M2), which are formed of different regions (E1, E2), are arranged on a carrier (T). The number of the regions and thereby the generated periods is such that one scale has m periods and the other m+1 periods over t...

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Bibliographische Detailangaben
Hauptverfasser: GALSTER, RUDOLF, 70839 GERLINGEN, DE, MARX, KLAUS., 70563 STUTTGART, DE, ROHDE, HARTMUT, 73235 WEILHEIM, DE, JOST, FRANZ., 70565 STUTTGART, DE
Format: Patent
Sprache:ger
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Zusammenfassung:A method of position measurement is carried out with a device in which two scales (M1, M2), which are formed of different regions (E1, E2), are arranged on a carrier (T). The number of the regions and thereby the generated periods is such that one scale has m periods and the other m+1 periods over the same measurement length L. The scales are scanned by respective sensors SE1 and SE2, which have a predetermined relationship with the position to be ascertained. The sensors SE1 and SE2 supply, according to their setting with respect to the scales M1 and M2, signals which are evaluated in evaluating equipment (A) with the aid of an algorithm. The algorithm takes into consideration the relationship between the two output signals, each normalised to its respective maximum, of the sensors and the number of the scale periods referred to the measurement length.