Semiconductor material treatment in cavitating liquid bath
A semiconductor material treatment process employs a liquid bath in which cavitation is induced preferably by a submerged nozzle which directs a liquid jet against the semiconductor material. Preferably, the liquid is water or an aqueous cleaning or etching medium and the semiconductor material is m...
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| creator | STEUDTEN, FRIEDRICH, 84489 BURGHAUSEN, DE SCHANTZ, MATTHAEUS, 84367 REUT, DE KOEPPL, FRANZ., 84567 ERLBACH, DE |
| description | A semiconductor material treatment process employs a liquid bath in which cavitation is induced preferably by a submerged nozzle which directs a liquid jet against the semiconductor material. Preferably, the liquid is water or an aqueous cleaning or etching medium and the semiconductor material is monocrystalline or polycrystalline silicon especially in fragment form. |
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Preferably, the liquid is water or an aqueous cleaning or etching medium and the semiconductor material is monocrystalline or polycrystalline silicon especially in fragment form.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| language | eng ; ger |
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| subjects | AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING CLEANING IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SEMICONDUCTOR DEVICES SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH TRANSPORTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL |
| title | Semiconductor material treatment in cavitating liquid bath |
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