Kolloidale Metallzubereitung und Verfahren zu ihrer Herstellung

A liquid preparation contains micelles which consist of a block copolymer that has at least one polymer block solvating in the solvent and one polymer block bindable for the colloidal metal and which contain colloidal metal enclosed in metallic, oxidic or sulfidic semiconductor form in an organic or...

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Hauptverfasser: BRONSTEIN, LYUDMILA., MOSKAU/MOSKVA, RU, FOERSTER, STEPHAN., 14195 BERLIN, DE, ANTONIETTI, MARKUS, DR., 35063 MARBURG, DE, WENZ, ECKHARD., 35096 WEIMAR, DE
Format: Patent
Sprache:ger
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Zusammenfassung:A liquid preparation contains micelles which consist of a block copolymer that has at least one polymer block solvating in the solvent and one polymer block bindable for the colloidal metal and which contain colloidal metal enclosed in metallic, oxidic or sulfidic semiconductor form in an organic or inorganic liquid solvent. To produce it, a salt of a metal that can be converted to a colloidal form is added to a solution of the block copolymer in a suitable solvent, forming metallic salt-containing micelles from the block copolymer; the salt is then reduced to form a colloid and the resulting colloidal metal is optionally converted with a sulfide or hydroxide donator to its sulfidic or oxidic semiconductor form or the salt is converted directly to its colloidal sulfidic or oxidic semiconductor form with a sulfide or hydroxide donator.