Verfahren zur Herstellung mindestens eines strahlungsemittierenden und /oder -empfangenden Halbleiterbauteils und Halbleiterbauteil

A method for producing a radiation-emitting or radiation-receiving semiconductor component is specified. In a method step, a carrier body having a mounting surface is provided. In a further method step, a barrier frame is formed on the mounting surface, in such a way that the barrier frame laterally...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: AHLSTEDT, MAGNUS, RAMCHEN, JOHANN
Format: Patent
Sprache:ger
Schlagworte:
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Beschreibung
Zusammenfassung:A method for producing a radiation-emitting or radiation-receiving semiconductor component is specified. In a method step, a carrier body having a mounting surface is provided. In a further method step, a barrier frame is formed on the mounting surface, in such a way that the barrier frame laterally encloses a mounting region of the mounting surface. In a further method step, a radiation-emitting or radiation-receiving semiconductor chip is mounted within the mounting region on the mounting surface. The semiconductor chip is potted with a liquid lens material, wherein the lens material is applied to the mounting surface within the mounting region. The lens material is cured. The mounting surface, the barrier frame and the lens material are adapted to one another.