Polishing method for multiple semiconductor disks has a number of polishing speeds and polishing-cloths to operate with rotary movements

Semiconductor disks are brought into contact with polishing-cloths at different polishing speeds when a polishing device is introduced. The semiconductor disks and polishing-cloths operate rotary motion in a defined direction of rotation. Verfahren zum Polieren einer Vielzahl von Halbleiterscheiben,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ROETTGER, KLAUS, THURNER, MANFRED
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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