Magnetron arrangement, comprises support, target placed on or above support, target retaining strip holding target, and electrically contacting resilient coupling structure arranged between target retaining strip and target

The magnetron arrangement comprises a support (3), a target (4) placed on or above the support, a target retaining strip (6) holding the target, and an electrically contacting resilient coupling structure (5) arranged between the strip and the target. The coupling structure is a spring element such as electrically conductive contact springs. The target has a central region and an edge area, where the central area is thicker than the edge area. The strip and the coupling structure are partially located above the edge area of the target. The magnetron arrangement comprises a support (3), a target (4) placed on or above the support, a target retaining strip (6) holding the target, and an electrically contacting resilient coupling structure (5) arranged between the strip and the target. The coupling structure is a spring element such as electrically conductive contact springs. The target has a central region and an edge area, where the central area is thicker than the edge area. The strip and the coupling structure are partially located above the edge area of the target. The coupling structure and the edge portion of the target are electrically and conductively coupled with each other. The magnetron further comprises: a magnetic structure (1), where the support is arranged between the magnetic structure and the target; and a cooling structure, where the support is arranged between the cooling structure and the target. In verschiedenen Ausführungsformen wird eine Magnetronanordnung (100) bereitgestellt, aufweisend: einen Träger (3); ein auf oder über dem Träger (3) angeordnetes Target (4); eine Target-Haltestruktur (6) zum Halten des Targets (4); und eine zwischen der Target-Haltestruktur (6) und dem Target (4) angeordnete und das Target (4) elektrisch kontaktierende elastische Kopplungsstruktur (5).