Magnetron sputtering device, used to perform vacuum-based physical vapor deposition for coating substrate with target material, includes magnet assembly that concentrates plasma over target surface and comprises hydraulic actuator

The magnetron sputtering device comprises a target of material (2) having a surface to be removed, and a magnet assembly for concentrating a plasma over the target surface. The magnet assembly is arranged opposite to a side of the target surface, is moved parallel with respective to the target surface, and comprises a hydraulic actuator and a restoring member. The hydraulic actuator includes a first operating direction, is present in operating connection with the magnet assembly, and is movable in the first operating direction. The restoring member comprises second operating direction. The magnetron sputtering device comprises a target of material (2) having a surface to be removed, and a magnet assembly for concentrating a plasma over the target surface. The magnet assembly is arranged opposite to a side of the target surface, is moved parallel with respective to the target surface, and comprises a hydraulic actuator and a restoring member. The hydraulic actuator includes a first operating direction, is present in operating connection with the magnet assembly, and is movable in the first operating direction. The restoring member comprises second operating direction opposite to the first operating direction, is present operating connection with the hydraulic actuator or the magnet assembly, and is movable in the second operating direction. The restoring member is a further hydraulic actuator. The hydraulic actuators are arranged to each other such that directions of the actuator are perpendicular to each other. The hydraulic actuator is configured as a hydraulic cylinder and as a hydraulic muscle. The magnetron sputtering device further comprises a coolant inlet and a coolant outlet for cooling of the target and the magnet assembly by a cooling agent, and a control valve (8) for controlling a flow rate of a hydraulic fluid to the hydraulic actuator. The inlet and outlet are arranged on a hydraulic fluid port of the hydraulic actuator such that a partial volume of a flow of the coolant is used as the hydraulic fluid for the hydraulic actuator. The control valve is arranged so to the flow of the hydraulic fluid is moved to a first end position of the magnet assembly in first operating direction and the flow of the hydraulic fluid is moved to a second end position of the magnet assembly in the second operating direction. The magnet assembly is movable in the first operating direction. Die Erfindung, welche eine Magnetronsputtereinrichtung betrifft, wie sie zu