Endblock für eine Magnetronanordnung mit einem rotierenden Target

To achieve an improved end block, in which heating by induction eddy currents, which may occur during AC sputtering, for example, is significantly reduced relative to known end blocks, an end block for a magnetron configuration having a rotating target comprises an end block housing having an attach...

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Bibliographische Detailangaben
Hauptverfasser: SEYFERT, ULF, HEINRICH, HANS-JUERGEN, TESCHNER, GOETZ
Format: Patent
Sprache:ger
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Beschreibung
Zusammenfassung:To achieve an improved end block, in which heating by induction eddy currents, which may occur during AC sputtering, for example, is significantly reduced relative to known end blocks, an end block for a magnetron configuration having a rotating target comprises an end block housing having an attachment surface for attaching the end block on a support apparatus, a pivot bearing for rotatable mounting of the rotating target, and at least one current conduction apparatus which conducts current through the end block housing in operation of the end block. The end block housing is implemented so that each current path in the end block housing which encloses the current conduction apparatus has an interruption at least one point.