Microlithographic projection exposure system has lightening system with multi-mirror array for adjusting intensity distribution in pupil level

The microlithographic projection exposure system has a lightening system (10) with a multi-mirror array (22) for adjusting an intensity distribution in a pupil level (30). The lightening system has mirror angle determination electronics, which is designed such that a vector length of the vector is d...

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Bibliographische Detailangaben
1. Verfasser:	MAJOR, ANDRAS G
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The microlithographic projection exposure system has a lightening system (10) with a multi-mirror array (22) for adjusting an intensity distribution in a pupil level (30). The lightening system has mirror angle determination electronics, which is designed such that a vector length of the vector is determined. The vector is rotated in a coordinate system successively on the coordinate axis of the coordinate system. An independent claim is included for a method for operating the microlithographic projection exposure system. Eine mikrolithographische Projektionsbelichtungsanlage hat ein Beleuchtungssystem (10), das ein Multi-Mirror-Array (22) zur Einstellung einer Intensitätsverteilung in einer Pupillenebene (30) aufweist. Das Beleuchtungssystem (10) weist eine Spiegelwinkelbestimmungselektronik (48) auf, die derart ausgelegt ist, dass eine Vektorlänge eines Vektors bestimmt werden kann, indem der Vektor in seinem Koordinatensystem sukzessive auf eine Koordinatenachse des Koordinatensystems gedreht wird.