Thin-layer thermocouple arrangement useful in thermo-generator to generate electrical energy from thermal energy, comprises thermocouple arranged on base layer with connection point and measuring point, and passivation layer on a top side
The thin-layer thermocouple arrangement useful in a thermo-generator for generating electrical energy from thermal energy, comprises a thermocouple arranged on a base layer (1) with a connection point (3) and a measuring point (4) for generating an electrical voltage at the connection point with a t...
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Zusammenfassung: | The thin-layer thermocouple arrangement useful in a thermo-generator for generating electrical energy from thermal energy, comprises a thermocouple arranged on a base layer (1) with a connection point (3) and a measuring point (4) for generating an electrical voltage at the connection point with a temperature difference between the connection point and measuring point, a passivation layer on a top side, a substrate arranged below the base layer in partial regions, and a silicon oxide layer arranged between the substrate and the base layer and having a thickness of 500 nm. The thin-layer thermocouple arrangement useful in a thermo-generator for generating electrical energy from thermal energy, comprises a thermocouple arranged on a base layer (1) with a connection point (3) and a measuring point (4) for generating an electrical voltage at the connection point with a temperature difference between the connection point and measuring point, a passivation layer on a top side, a substrate arranged below the base layer in partial regions, and a silicon oxide layer arranged between the substrate and the base layer and having a thickness of 500 nm. The thermocouple comprises a first path (5), and a second path (6), which extends itself between the connection point and the measuring point. The paths are connected with one another at the measuring point over a diffusion barrier. The first path and/or the second path, the passivation layer and the base layer have a thickness of 300 nm. The diffusion barrier has a thickness of 40 nm. The passivation layer is applied by a low pressure chemical vapor deposition process at 800-850[deg] C. Several thermocouples are arranged in a row. Two adjacent thermocouples are connected with one another in the row, so that the ends of the first path of the one of the adjacent thermocouple are electrically connected together with the ends of the second path of the other adjacent thermocouple over the diffusion barrier. The ends of the first and second paths lie at the connection point. Independent claims are included for: (1) a thermoelectric sensor; and (2) a method for producing a thermocouple arrangement.
Die Erfindung beschreibt eine Dünnschicht-Thermoelement-Anordnung mit wenigstens einem auf einer Basisschicht (1) angeordnetem Thermoelement mit einer Anschlussstelle (3) und einer Messstelle (4) zur Erzeugung einer elektrischen Spannung an der Anschlussstelle (3) bei einer Temperaturdifferenz zwischen Anschluss- und Messstelle (3, |
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