Production of pure nickel(IV) oxide comprises vaporizing two-nickel electrodes by formation of periodically constructed and degraded plasma produced by arc, and oxidizing the vaporized nickel in cooled water

The production of pure nickel(IV) oxide comprises vaporizing two nickel electrodes (1, 2) by formation of periodically constructed and degraded plasma produced by an arc, and oxidizing the vaporized nickel in degassed and deionized cooled water at 0-10[deg]C. The nickel has a purity of more than 95 wt.%. One of the electrodes is moved on the other electrode by a feeding device. Current pulses are produced with 0.005 seconds and produced in the interval of 0.02 seconds for the arc plasma production. The voltage of the current pulses is 20-40 volt. The production of pure nickel(IV) oxide comprises vaporizing two nickel electrodes (1, 2) by formation of periodically constructed and degraded plasma produced by an arc, and oxidizing the vaporized nickel in degassed and deionized cooled water at 0-10[deg]C. The nickel has a purity of more than 95 wt.%. One of the electrodes is moved on the other electrode by a feeding device. Current pulses are produced with 0.005 seconds and produced in the interval of 0.02 seconds for the arc plasma production. The voltage of the current pulses is 20-40 volt. Instead of the cooled water, another oxidizing substance as reaction environment is used such as oxygen, ozone and peroxides in gaseous, liquid or dissolved form. Die Erfindung betrifft ein Herstellungsverfahren für reines Nickel. Erfindungsgemäß werden zwei Nickelelektroden durch Bildung eines periodisch auf- und abgebauten (gepulsten) Plasmas verdampft. Anschließend wird das verdampfte Nickel zum Beispiel in Eiswasser oxidiert.