Cooled target material for a magnetron system is produced with cross cuts to improve the functional stability
The target material used in a high energy cathode unit has a sputter channel [12] having parallel sections linked by curved end sections. The surface of the target material has a number of cross cuts [13,14] formed in the surface that improves stability. Die Erfindung betrifft ein längs erstrecktes,...
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creator | KOPTE, TORSTEN WEISKE, DIETER BUSCHBECK, GUNTER KRAUSE, UWE HARTUNG, ULLRICH |
description | The target material used in a high energy cathode unit has a sputter channel [12] having parallel sections linked by curved end sections. The surface of the target material has a number of cross cuts [13,14] formed in the surface that improves stability.
Die Erfindung betrifft ein längs erstrecktes, direkt gekühltes Massivtarget (11) für Magnetronsysteme, bei dem die mittels eines Magnetrons zu zerstäubende Oberfläche des Targets wenigstens einen im Wesentlichen quer zur Längsausdehnung des Targets verlaufenden Einschnitt (13) aufweist, der sich zumindest über einen sich während des Zerstäubens ausbildenden Sputtergraben (12) erstreckt. |
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Die Erfindung betrifft ein längs erstrecktes, direkt gekühltes Massivtarget (11) für Magnetronsysteme, bei dem die mittels eines Magnetrons zu zerstäubende Oberfläche des Targets wenigstens einen im Wesentlichen quer zur Längsausdehnung des Targets verlaufenden Einschnitt (13) aufweist, der sich zumindest über einen sich während des Zerstäubens ausbildenden Sputtergraben (12) erstreckt.</description><language>eng ; ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061228&DB=EPODOC&CC=DE&NR=102005028729A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20061228&DB=EPODOC&CC=DE&NR=102005028729A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KOPTE, TORSTEN</creatorcontrib><creatorcontrib>WEISKE, DIETER</creatorcontrib><creatorcontrib>BUSCHBECK, GUNTER</creatorcontrib><creatorcontrib>KRAUSE, UWE</creatorcontrib><creatorcontrib>HARTUNG, ULLRICH</creatorcontrib><title>Cooled target material for a magnetron system is produced with cross cuts to improve the functional stability</title><description>The target material used in a high energy cathode unit has a sputter channel [12] having parallel sections linked by curved end sections. The surface of the target material has a number of cross cuts [13,14] formed in the surface that improves stability.
Die Erfindung betrifft ein längs erstrecktes, direkt gekühltes Massivtarget (11) für Magnetronsysteme, bei dem die mittels eines Magnetrons zu zerstäubende Oberfläche des Targets wenigstens einen im Wesentlichen quer zur Längsausdehnung des Targets verlaufenden Einschnitt (13) aufweist, der sich zumindest über einen sich während des Zerstäubens ausbildenden Sputtergraben (12) erstreckt.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjbEOwjAMRLswIOAfvDAipUUIGFEp4gPYKxPcNlISV7EL6t-TgQ9gOp3u3d2yCDWzpxcopp4UAiolhx46ToDZ9pE0cQSZRSmAExgTvyabKx-nA9jEImAnFVAGF3L6JtCBoJuiVccxj4ni03mn87pYdOiFNj9dFdtb86jvOxq5JRnRUv5rr01pKmMOpjodq_Ol3P_LfQGiwkQf</recordid><startdate>20061228</startdate><enddate>20061228</enddate><creator>KOPTE, TORSTEN</creator><creator>WEISKE, DIETER</creator><creator>BUSCHBECK, GUNTER</creator><creator>KRAUSE, UWE</creator><creator>HARTUNG, ULLRICH</creator><scope>EVB</scope></search><sort><creationdate>20061228</creationdate><title>Cooled target material for a magnetron system is produced with cross cuts to improve the functional stability</title><author>KOPTE, TORSTEN ; WEISKE, DIETER ; BUSCHBECK, GUNTER ; KRAUSE, UWE ; HARTUNG, ULLRICH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE102005028729A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; ger</language><creationdate>2006</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>KOPTE, TORSTEN</creatorcontrib><creatorcontrib>WEISKE, DIETER</creatorcontrib><creatorcontrib>BUSCHBECK, GUNTER</creatorcontrib><creatorcontrib>KRAUSE, UWE</creatorcontrib><creatorcontrib>HARTUNG, ULLRICH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KOPTE, TORSTEN</au><au>WEISKE, DIETER</au><au>BUSCHBECK, GUNTER</au><au>KRAUSE, UWE</au><au>HARTUNG, ULLRICH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Cooled target material for a magnetron system is produced with cross cuts to improve the functional stability</title><date>2006-12-28</date><risdate>2006</risdate><abstract>The target material used in a high energy cathode unit has a sputter channel [12] having parallel sections linked by curved end sections. The surface of the target material has a number of cross cuts [13,14] formed in the surface that improves stability.
Die Erfindung betrifft ein längs erstrecktes, direkt gekühltes Massivtarget (11) für Magnetronsysteme, bei dem die mittels eines Magnetrons zu zerstäubende Oberfläche des Targets wenigstens einen im Wesentlichen quer zur Längsausdehnung des Targets verlaufenden Einschnitt (13) aufweist, der sich zumindest über einen sich während des Zerstäubens ausbildenden Sputtergraben (12) erstreckt.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Cooled target material for a magnetron system is produced with cross cuts to improve the functional stability |
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