Integrated circuit e.g. NROM, path pattern lithographic projection method, involves operating projection apparatus in two modes to project pattern onto resist layer, and controlling phase of exposure light by alternating phase shift mask

The method involves applying a photoresist layer (10) on top of a semiconductor wafer (5). A projection apparatus is operated in two modes to project a circuit path pattern (14) onto the layer, where exposure light intensity is selected to be above an exposure threshold of the layer in one mode. The...

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Bibliographische Detailangaben

Hauptverfasser:	HENKE, WOLFGANG, KUNKEL, GERHARD, JAHNKE, ANDREAS, TEIPEL, ANSGAR, IACONO, STEPHANIE
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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