Process for adjusting the height of the step between active regions and insulating regions during the production of integrated circuits involves implanting an electrically non-active element

Process for adjusting height of step between active and insulating regions during production of integrated circuits comprises: etching trenches (6) filled with oxide (8') in a semiconductor substrate (1) to isolate active regions; and implanting electrically non-active element into oxide (8...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TRUEBY, ALEXANDER, CURELLO, GIUSEPPE, AMON, JUERGEN
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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