Exposure mask has alignment pattern with outer radiation transmissive area of row section and adjacent area of pattern at greater or lesser distance than adjacent areas within section

The mask has at least one alignment pattern for producing an alignment structure on a semiconducting plate. The pattern has radiation transmission areas in a row in an absorbent material. Adjacent areas in a section of at least three successive areas in the row have the same separation. An outer are...

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Bibliographische Detailangaben

1. Verfasser:	STEINKIRCHNER, ERWIN
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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