Verfahren zur quantitativen und/oder qualitativen Bestimmung von Schichtdicken sowie ein Mikroreaktionsgefäß und eine Titerplatte
The method involves performing ellipsometric measurements with the radiation angle of incidence and/or frequency set to produce surface plasmon resonance in a metal layer. Detection sensitivity is set over the thickness of the metal layer, the radiation is applied on the side of the metal layer away...
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Zusammenfassung: | The method involves performing ellipsometric measurements with the radiation angle of incidence and/or frequency set to produce surface plasmon resonance in a metal layer. Detection sensitivity is set over the thickness of the metal layer, the radiation is applied on the side of the metal layer away from an immobilizing layer, a measurement is made during/after separation and an associated value is evaluated to determine the thickness variation. The method involves performing ellipsometric measurements whereby the angle of incidence and/or frequency of the electromagnetic radiation used for the measurements are set so that surface plasmon resonance is generated in a metal layer (5). The detection sensitivity is set over the thickness of the metal layer, the electromagnetic radiation is applied on the side of the metal layer facing away from an immobilizing layer (6) and at least one measurement is made during or after the separation and at least an associated parameter cosine value is evaluated to determine the thickness variation. Independent claims are also included for the following: a titre plate and a micro reaction vessel. |
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