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PCT No. PCT/US85/00033 Sec. 371 Date Jan. 28, 1986 Sec. 102(e) Date Jan. 28, 1986 PCT Filed Apr. 24, 1985 PCT Pub. No. WO86/00092 PCT Pub. Date Jan. 3, 1986.An evaporator for depositing films in a vacuum consisting of a crucible for containing an evaporant and adapted to be heated by a heater. A tub...

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Hauptverfasser:	LEVCENKO,GEORGIJ T.,SU, RADZINOVSKIJ,ALEKSANDR N.,SU
Format:	Patent
Sprache:	ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Zusammenfassung:	PCT No. PCT/US85/00033 Sec. 371 Date Jan. 28, 1986 Sec. 102(e) Date Jan. 28, 1986 PCT Filed Apr. 24, 1985 PCT Pub. No. WO86/00092 PCT Pub. Date Jan. 3, 1986.An evaporator for depositing films in a vacuum consisting of a crucible for containing an evaporant and adapted to be heated by a heater. A tube is provided for forming a directional flow of evaporant toward a substrate. The tube has a mounting structure at both ends so that the tube can be alternately mounted in the crucible at each end about a transverse symmetry plane.