Process for producing micro-plates based on silicon dioxide

No Abstract Zp sob v²roby spo v v tom, e dut sklen n mikrokuli ky z borok°emi it ho skla se rozemelou a n sledn chemicky stabilizuj miner ln kyselinou p°i teplot 20 a 105 .degree.C, promyj od zbytk kyseliny a tepeln upravuj p°i 400 a 500 .degree.C.\ The proposed process is characterized in that hollow glass micro-bubbles of borosilicate glass are ground and subsequently chemically stabilized by employing an inorganic acid at a temperature ranging from 20 to 105 degC, washed to remove acid residues and finally they are subjected to heat treatment at a temperature ranging from 400 to 500 degC.