Continuous manufacturing process of recycling, silicate, flat, decorative, sintered lining material
Odpadov sklo se zah° v na teplotu 1200 .degree.C a 1800 .degree.C, spodn frakce taveniny se odstra uje a horn se p°epouÜt do vodn l zn o teplot 90 .degree.C a 100 .degree.C. Hmota se drt na pr m r do 3 mm a v pom ru 70 a 80 d l se m s s 20 a 30 d ly k°emi it ho materi lu zrnitosti do 3 mm a s 1 a 2...
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Zusammenfassung: | Odpadov sklo se zah° v na teplotu 1200 .degree.C a 1800 .degree.C, spodn frakce taveniny se odstra uje a horn se p°epouÜt do vodn l zn o teplot 90 .degree.C a 100 .degree.C. Hmota se drt na pr m r do 3 mm a v pom ru 70 a 80 d l se m s s 20 a 30 d ly k°emi it ho materi lu zrnitosti do 3 mm a s 1 a 2 d ly k°emi itanu sodn ho, mlet ho na frakci do 3 mm a s 2 a 5 d ly vody, pot se sm s vrstv do forem na tlouÜ ku vrstvy 8 a 15 mm a rychlost 0,3 a 0,4 m/min proch z za° zen m, kde se oh° v na teplotu 850 .degree.C a 950 .degree.C v pr b hu 35 a 40 minut. Pot se povrchov ochlad na teplotu 720 .degree.C a 750 .degree.C v pr b hu 5 a 10 minut, na e se rychlost 2 a 4 .degree.C/min chlad na teplotu 450 .degree.C a 500 .degree.C a d le se chlad rychlost 5 a 10 .degree.C/min na teplotu 50 .degree.C a 60 .degree.C a o°ez v na po adovan² rozm r. Ke sklen n²m granul m se alternativn p°id v 0,1 a 1 d l t novac ho pigmentu, p° padn 1 a 5 d l k°iÜ lov ho skl\
Waste glass is heated to a temperature in the range of 1200 degC to 1800 degC, lower fraction of the melt is then removed and the upper one is delivered to a water bath with temperature in the range of 90 degC to 100 degC. The matter is then crushed to particles with diameter up to 3 mm and in ration ranging from 70 to 80 parts it is mixed with 20 to 30 parts of silicon material of grain size up to 3 mm and further with 1 to 2 parts of sodium silicate, ground to a fraction up to 3 mm in diameter and with 2 to 5 parts of water. Subsequently the mixture is poured into molds to a layer thickness within the range of 8 to 15 mm and at a rate of 0.3 to 0.4 m/min it passes through a device where it is heated up to a temperature ranging from 850 degC to 950 degC for a period of 35 to 40 minutes. Then surface thereof is cooled down to temperature within the range of 720 degC to 750 degC within 5 to 10 minutes, whereupon it is further cooled down at a rate of 2 to 4 degC/min to a temperature ran |
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