NEGATIVE ELECTRON AND X-RAY RESIST

Bibliographische Detailangaben

Hauptverfasser:	MISTR ADOLF CSC.,CS, MAROUSEK VLADIMIR CSC.,CS, BEDNAR BOHUMIL DOC. CSC.,CS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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