DEVICE FOR LATCHES OPENING
Chem-mech polishing slurry comprises: abrasive particles; a transition metal chelated salt (I); and a solvent. (I) is pref. an Fe, Co or Ni salt, esp. ammonium-Fe EDTA. A passivating agent is pref. also included, pref. a phosphate esp. dil. H3PO4 or (NH4)3PO4.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Chem-mech polishing slurry comprises: abrasive particles; a transition metal chelated salt (I); and a solvent. (I) is pref. an Fe, Co or Ni salt, esp. ammonium-Fe EDTA. A passivating agent is pref. also included, pref. a phosphate esp. dil. H3PO4 or (NH4)3PO4. |
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