Nano-class pattern impression device
The utility model relates to a nanometer rank pattern impression device which is characterized in that the utility model comprises a pressure control component, a movement guarantee controllable component, a temperature control component and an adsorption component, wherein the pressure control comp...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | WENQI GU WEIHUA SI XIAOWEN DONG |
| description | The utility model relates to a nanometer rank pattern impression device which is characterized in that the utility model comprises a pressure control component, a movement guarantee controllable component, a temperature control component and an adsorption component, wherein the pressure control component is positioned at the middle upper part of a pressure guide circular cylinder [7] which is arranged on a rack supporting plate [6]; the movement guarantee control component is arranged at the lower part of the pressure guide circular cylinder [7] by a spline guide circular cylinder [13]; an upper vacuum chuck [17] of the adsorption component is connected with a spline guide bar [14] of the movement guarantee controllable component; a lower vacuum chuck [18] is connected with a supporting plate [10] on a base seat of a rack; the temperature control component is positioned below the lower vacuum chuck [18] of the adsorption component, wherein the upper surface of a heating device [19] is closely contacted with the lower surface of the lower vacuum chuck [18]. The utility model has the advantages of low equipment cost, reliability, practicality and convenient operation. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN2762187YY</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN2762187YY</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN2762187YY3</originalsourceid><addsrcrecordid>eNrjZFDxS8zL103OSSwuVihILClJLcpTyMwtKEotLs7Mz1NISS3LTE7lYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxzn5G5mZGhhbmkZHGRCgBAN6bJxM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Nano-class pattern impression device</title><source>esp@cenet</source><creator>WENQI GU ; WEIHUA SI ; XIAOWEN DONG</creator><creatorcontrib>WENQI GU ; WEIHUA SI ; XIAOWEN DONG</creatorcontrib><description>The utility model relates to a nanometer rank pattern impression device which is characterized in that the utility model comprises a pressure control component, a movement guarantee controllable component, a temperature control component and an adsorption component, wherein the pressure control component is positioned at the middle upper part of a pressure guide circular cylinder [7] which is arranged on a rack supporting plate [6]; the movement guarantee control component is arranged at the lower part of the pressure guide circular cylinder [7] by a spline guide circular cylinder [13]; an upper vacuum chuck [17] of the adsorption component is connected with a spline guide bar [14] of the movement guarantee controllable component; a lower vacuum chuck [18] is connected with a supporting plate [10] on a base seat of a rack; the temperature control component is positioned below the lower vacuum chuck [18] of the adsorption component, wherein the upper surface of a heating device [19] is closely contacted with the lower surface of the lower vacuum chuck [18]. The utility model has the advantages of low equipment cost, reliability, practicality and convenient operation.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2006</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060301&DB=EPODOC&CC=CN&NR=2762187Y$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060301&DB=EPODOC&CC=CN&NR=2762187Y$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WENQI GU</creatorcontrib><creatorcontrib>WEIHUA SI</creatorcontrib><creatorcontrib>XIAOWEN DONG</creatorcontrib><title>Nano-class pattern impression device</title><description>The utility model relates to a nanometer rank pattern impression device which is characterized in that the utility model comprises a pressure control component, a movement guarantee controllable component, a temperature control component and an adsorption component, wherein the pressure control component is positioned at the middle upper part of a pressure guide circular cylinder [7] which is arranged on a rack supporting plate [6]; the movement guarantee control component is arranged at the lower part of the pressure guide circular cylinder [7] by a spline guide circular cylinder [13]; an upper vacuum chuck [17] of the adsorption component is connected with a spline guide bar [14] of the movement guarantee controllable component; a lower vacuum chuck [18] is connected with a supporting plate [10] on a base seat of a rack; the temperature control component is positioned below the lower vacuum chuck [18] of the adsorption component, wherein the upper surface of a heating device [19] is closely contacted with the lower surface of the lower vacuum chuck [18]. The utility model has the advantages of low equipment cost, reliability, practicality and convenient operation.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2006</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDxS8zL103OSSwuVihILClJLcpTyMwtKEotLs7Mz1NISS3LTE7lYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxzn5G5mZGhhbmkZHGRCgBAN6bJxM</recordid><startdate>20060301</startdate><enddate>20060301</enddate><creator>WENQI GU</creator><creator>WEIHUA SI</creator><creator>XIAOWEN DONG</creator><scope>EVB</scope></search><sort><creationdate>20060301</creationdate><title>Nano-class pattern impression device</title><author>WENQI GU ; WEIHUA SI ; XIAOWEN DONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN2762187YY3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2006</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>WENQI GU</creatorcontrib><creatorcontrib>WEIHUA SI</creatorcontrib><creatorcontrib>XIAOWEN DONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WENQI GU</au><au>WEIHUA SI</au><au>XIAOWEN DONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Nano-class pattern impression device</title><date>2006-03-01</date><risdate>2006</risdate><abstract>The utility model relates to a nanometer rank pattern impression device which is characterized in that the utility model comprises a pressure control component, a movement guarantee controllable component, a temperature control component and an adsorption component, wherein the pressure control component is positioned at the middle upper part of a pressure guide circular cylinder [7] which is arranged on a rack supporting plate [6]; the movement guarantee control component is arranged at the lower part of the pressure guide circular cylinder [7] by a spline guide circular cylinder [13]; an upper vacuum chuck [17] of the adsorption component is connected with a spline guide bar [14] of the movement guarantee controllable component; a lower vacuum chuck [18] is connected with a supporting plate [10] on a base seat of a rack; the temperature control component is positioned below the lower vacuum chuck [18] of the adsorption component, wherein the upper surface of a heating device [19] is closely contacted with the lower surface of the lower vacuum chuck [18]. The utility model has the advantages of low equipment cost, reliability, practicality and convenient operation.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_CN2762187YY |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Nano-class pattern impression device |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-23T07%3A30%3A49IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WENQI%20GU&rft.date=2006-03-01&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN2762187YY%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |