Metal ion implanter

The utility model discloses a metal ion implanter in order to provide a metal ion implanter with strong ion beam, low beam leading voltage, large implanting area, short implanting time and low processing cost. A metal ion source 1 of the utility model comprises a negative pole 5, a negative support bracket 6, a trigging electrode 7, an insulated negative sleeve 8, a positive pole 9, a positive support bracket 10, a discharging chamber 11, a plasma chamber 12, a first grid 13, a second grid 14 and a third grid 15. The space between the first grid 13 and the second grid 14 is 5-10mm, the thickness of the three grids are all 2-5mm, 1300-1800 phi 3-5mm apertures are arranged on the three grids, the characteristic impedance of the arc voltage power supply 19 of the utility model is 1 omega, the pulse width is 1. 44-0. 65ms, and the frequency is 5-25Hz. The utility model can be used in production field.