Vertical double chamber double-face plating magnetron sputtering winding film plating machine
The utility model discloses a double chamber double-face magnetic control sputtering winding film coating machine. The utility model is characterized in that the whole machine body is provided with an inverted U-shaped vacuum chamber body structure; two material collecting or placing chambers (8, 8a...
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| creator | JIANWU PENG WENBIN HU SHUO TANG |
| description | The utility model discloses a double chamber double-face magnetic control sputtering winding film coating machine. The utility model is characterized in that the whole machine body is provided with an inverted U-shaped vacuum chamber body structure; two material collecting or placing chambers (8, 8a) are positioned at the both ends of the lower part; the upper parts of the two material collecting or placing chambers (8, 8a) are respectively connected with two vertical tunnel type film coating chambers (6, 6a), and the two film coating chambers (6, 6a) are communicated by a connecting path (1) at the upper part. The utility model is a double chamber double-face magnetic control sputtering winding film coating machine which has high handling ability, and can realize the multilayer film assembly of different materials, with convenient operation and maintenance. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN2700342YY</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN2700342YY</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN2700342YY3</originalsourceid><addsrcrecordid>eNrjZIgNSy0qyUxOzFFIyS9NyklVSM5IzE1KLYJyddMSk1MVCnISSzLz0hVyE9PzUkuK8vMUigtKS0pSi0CC5Zl5KSA6LTMnF0llckZmXioPA2taYk5xKi-U5mZQcHMNcfbQTS3Ij08tLgAaDjQw3tnPyNzAwNjEKDLSmAglAMO6PLE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vertical double chamber double-face plating magnetron sputtering winding film plating machine</title><source>esp@cenet</source><creator>JIANWU PENG ; WENBIN HU ; SHUO TANG</creator><creatorcontrib>JIANWU PENG ; WENBIN HU ; SHUO TANG</creatorcontrib><description>The utility model discloses a double chamber double-face magnetic control sputtering winding film coating machine. The utility model is characterized in that the whole machine body is provided with an inverted U-shaped vacuum chamber body structure; two material collecting or placing chambers (8, 8a) are positioned at the both ends of the lower part; the upper parts of the two material collecting or placing chambers (8, 8a) are respectively connected with two vertical tunnel type film coating chambers (6, 6a), and the two film coating chambers (6, 6a) are communicated by a connecting path (1) at the upper part. The utility model is a double chamber double-face magnetic control sputtering winding film coating machine which has high handling ability, and can realize the multilayer film assembly of different materials, with convenient operation and maintenance.</description><edition>7</edition><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050518&DB=EPODOC&CC=CN&NR=2700342Y$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050518&DB=EPODOC&CC=CN&NR=2700342Y$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JIANWU PENG</creatorcontrib><creatorcontrib>WENBIN HU</creatorcontrib><creatorcontrib>SHUO TANG</creatorcontrib><title>Vertical double chamber double-face plating magnetron sputtering winding film plating machine</title><description>The utility model discloses a double chamber double-face magnetic control sputtering winding film coating machine. The utility model is characterized in that the whole machine body is provided with an inverted U-shaped vacuum chamber body structure; two material collecting or placing chambers (8, 8a) are positioned at the both ends of the lower part; the upper parts of the two material collecting or placing chambers (8, 8a) are respectively connected with two vertical tunnel type film coating chambers (6, 6a), and the two film coating chambers (6, 6a) are communicated by a connecting path (1) at the upper part. The utility model is a double chamber double-face magnetic control sputtering winding film coating machine which has high handling ability, and can realize the multilayer film assembly of different materials, with convenient operation and maintenance.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgNSy0qyUxOzFFIyS9NyklVSM5IzE1KLYJyddMSk1MVCnISSzLz0hVyE9PzUkuK8vMUigtKS0pSi0CC5Zl5KSA6LTMnF0llckZmXioPA2taYk5xKi-U5mZQcHMNcfbQTS3Ij08tLgAaDjQw3tnPyNzAwNjEKDLSmAglAMO6PLE</recordid><startdate>20050518</startdate><enddate>20050518</enddate><creator>JIANWU PENG</creator><creator>WENBIN HU</creator><creator>SHUO TANG</creator><scope>EVB</scope></search><sort><creationdate>20050518</creationdate><title>Vertical double chamber double-face plating magnetron sputtering winding film plating machine</title><author>JIANWU PENG ; WENBIN HU ; SHUO TANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN2700342YY3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>JIANWU PENG</creatorcontrib><creatorcontrib>WENBIN HU</creatorcontrib><creatorcontrib>SHUO TANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JIANWU PENG</au><au>WENBIN HU</au><au>SHUO TANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vertical double chamber double-face plating magnetron sputtering winding film plating machine</title><date>2005-05-18</date><risdate>2005</risdate><abstract>The utility model discloses a double chamber double-face magnetic control sputtering winding film coating machine. The utility model is characterized in that the whole machine body is provided with an inverted U-shaped vacuum chamber body structure; two material collecting or placing chambers (8, 8a) are positioned at the both ends of the lower part; the upper parts of the two material collecting or placing chambers (8, 8a) are respectively connected with two vertical tunnel type film coating chambers (6, 6a), and the two film coating chambers (6, 6a) are communicated by a connecting path (1) at the upper part. The utility model is a double chamber double-face magnetic control sputtering winding film coating machine which has high handling ability, and can realize the multilayer film assembly of different materials, with convenient operation and maintenance.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Vertical double chamber double-face plating magnetron sputtering winding film plating machine |
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