Vertical double chamber double-face plating magnetron sputtering winding film plating machine
The utility model discloses a double chamber double-face magnetic control sputtering winding film coating machine. The utility model is characterized in that the whole machine body is provided with an inverted U-shaped vacuum chamber body structure; two material collecting or placing chambers (8, 8a...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | The utility model discloses a double chamber double-face magnetic control sputtering winding film coating machine. The utility model is characterized in that the whole machine body is provided with an inverted U-shaped vacuum chamber body structure; two material collecting or placing chambers (8, 8a) are positioned at the both ends of the lower part; the upper parts of the two material collecting or placing chambers (8, 8a) are respectively connected with two vertical tunnel type film coating chambers (6, 6a), and the two film coating chambers (6, 6a) are communicated by a connecting path (1) at the upper part. The utility model is a double chamber double-face magnetic control sputtering winding film coating machine which has high handling ability, and can realize the multilayer film assembly of different materials, with convenient operation and maintenance. |
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