Cutter device with diamond-coating film

The utility model discloses a diamond coating cutter device, which comprises a plasma reaction cavity, a direct current stabilized current power supply, a mass flow meter, a high vacuum pump, and a coupling. The utility model is characterized in that a high vacuum valve is respectively connected wit...

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Bibliographische Detailangaben
Hauptverfasser:	SHUNSHENG LIU, ENTAO YAN, HUIFANG FU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The utility model discloses a diamond coating cutter device, which comprises a plasma reaction cavity, a direct current stabilized current power supply, a mass flow meter, a high vacuum pump, and a coupling. The utility model is characterized in that a high vacuum valve is respectively connected with the plasma reaction cavity and the high vacuum pump, an air inlet valve is respectively connected with the plasma reaction cavity and the mass flow meter, and an electrode rod is respectively connected with the anode and the cathode of an arc discharge electrode in the plasma reaction cavity, and the anode and the cathode of the direct current stabilized current power supply. The device has the advantages that the structure is simple, the operation is convenient, the performance is stable, the mass production of the diamond coating cutter is realized, and the adhesive property of the diamond coating and the cutter substrate can achieve 5-6 kg / mm .