Mixed waste gas treatment device for chip manufacturing epitaxial furnace
The utility model discloses a chip manufacturing epitaxial furnace mixed waste gas treatment device, which comprises a plurality of epitaxial furnaces, a conveying pipe and an alkaline spray tower, and further comprises an oxidation unit which is fixedly connected between the plurality of epitaxial...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses a chip manufacturing epitaxial furnace mixed waste gas treatment device, which comprises a plurality of epitaxial furnaces, a conveying pipe and an alkaline spray tower, and further comprises an oxidation unit which is fixedly connected between the plurality of epitaxial furnaces and the alkaline spray tower and is used for oxidizing waste gas generated by the epitaxial furnaces; wherein the epitaxial furnace, the alkaline spray tower and the oxidation unit are connected through a conveying pipe; the oxidation unit comprises a plurality of vacuum pumps, and one end of each vacuum pump is fixedly connected to a waste gas exhaust port of each epitaxial furnace; the buffer tank is fixedly connected to the merging end of the other ends of the vacuum pumps; the combustion assembly is fixedly connected between the buffer tank and the alkaline spray tower, in daily production and life, through the arrangement of the buffer tank, waste gas generated by the epitaxial furnace is discharged i |
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