Horizontal rotating device for wafer box cleaning rack

A horizontal rotating device for a wafer box cleaning frame comprises a turbine assembly, a worm assembly and a rotating platform, the turbine assembly comprises a turbine rod, a turbine main body and a positioning assembly, the positioning assembly comprises a seat body, a U-shaped seat and a posit...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIU CHUQUN, PAN JINGBO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A horizontal rotating device for a wafer box cleaning frame comprises a turbine assembly, a worm assembly and a rotating platform, the turbine assembly comprises a turbine rod, a turbine main body and a positioning assembly, the positioning assembly comprises a seat body, a U-shaped seat and a positioning piece, the U-shaped seat is provided with a U-shaped groove, and the positioning piece is provided with a U-shaped groove. A limiting groove is formed in the positioning piece, a positioning pin is inserted between the two sections of the U-shaped seat, and the positioning pin is inserted in the limiting groove. According to the horizontal rotating device for the wafer box cleaning frame, the positioning assembly is used, so that the position of the rotating platform and the position of the turbine assembly are relatively fixed, and the situation that rotation is affected due to dislocation of the turbine assembly and the rotating platform used for installing the cleaning frame caused by shaking of the clean