Platform adjusting structure and 3D photoetching experiment device
The utility model discloses a platform adjusting structure and a 3D photoetching experiment device, the platform adjusting structure comprises an adjusting seat, the adjusting seat is used for installing a 3D photoetching technology experiment platform, the adjusting seat comprises an air bag, and t...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model discloses a platform adjusting structure and a 3D photoetching experiment device, the platform adjusting structure comprises an adjusting seat, the adjusting seat is used for installing a 3D photoetching technology experiment platform, the adjusting seat comprises an air bag, and the air bag is used for adjusting the 3D photoetching technology experiment platform; the first pipeline is connected with an air source and is used for allowing air to enter the air bag so as to enable the air bag to jack the 3D photoetching technology experiment platform; and the second pipeline is used for discharging gas in the air bag so as to enable the 3D photoetching technology experiment platform to fall back. According to the technical scheme, the problem that the jacking speed of an existing 3D photoetching technology experiment platform is low is solved.
本实用新型公开一种平台调节结构和3D光刻实验装置,其中,平台调节结构包括调节座,用以供所述3D光刻技术实验平台安装,调节座包括气囊,所述气囊用以调节所述3D光刻技术实验平台;第一管道,连接气源,用以供气体进入所述气囊,以使所述气囊顶升所述3D光刻技术实验平台;第二管道,用以供所述气囊内部气体排出,以使所 |
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