Valve island for improving uniformity of precursor and atomic layer deposition equipment

The utility model discloses a valve terminal for improving the uniformity of a precursor. The valve terminal comprises a shell, a first pipeline assembly and a second pipeline assembly. The first pipeline assembly is used for inputting a first gas source into the at least two reaction cavities at the same time, and the two ends of the first pipeline assembly penetrate through the shell and communicate with the outside of the shell; the first pipeline assembly comprises at least two first gas source input pipelines and at least two first gas source output pipelines, and the first gas source input pipelines are connected to the first gas source output pipelines after being converged; the second pipeline assembly and the first pipeline assembly are basically arranged correspondingly; and one first gas source output pipeline and one second gas source output pipeline are communicated with a reaction cavity together. According to the embodiment of the invention, the arrangement and arrangement of the pipelines and