Fused quartz glass etching device
The utility model aims to provide a fused quartz glass etching device. The fused quartz glass etching device comprises an etching tank, a clamping mechanism, an ultrasonic device, a water circulation system, an etching liquid circulation system and a liquid discharge pipe, the upper end of the etchi...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model aims to provide a fused quartz glass etching device. The fused quartz glass etching device comprises an etching tank, a clamping mechanism, an ultrasonic device, a water circulation system, an etching liquid circulation system and a liquid discharge pipe, the upper end of the etching groove is of an opening structure, and the clamping mechanism is arranged in the etching groove and used for clamping fused quartz glass; the etching liquid circulating system is connected with the etching tank and is used for recycling the etching liquid in the etching tank; a drain pipe is arranged at the bottom of the etching tank, and a drain valve is arranged on the drain pipe; the water circulation system is connected with the etching tank and is used for cleaning the etching tank and the fused quartz glass in the etching tank by circulating water; and an ultrasonic device is arranged in the etching groove. The cleaning device is scientific and reasonable in structural design and lower in cost, cleaning an |
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