Wafer fixing seat with multiple exposure angles

The utility model provides a wafer fixing seat with multiple exposure angles, which comprises a base, a wafer positioning frame and a mask plate positioning mechanism, the base is provided with a side surface a and a plurality of side surfaces b, and the included angle between the side surface a and...

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Bibliographische Detailangaben
Hauptverfasser:	RUAN XIANGYU, LI TIANBAO, PENG KANG, MAO YU, WAN YANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The utility model provides a wafer fixing seat with multiple exposure angles, which comprises a base, a wafer positioning frame and a mask plate positioning mechanism, the base is provided with a side surface a and a plurality of side surfaces b, and the included angle between the side surface a and the side surface b is less than 90 degrees; the wafer positioning frame is movably arranged on the side surface a, and the wafer positioning frame is provided with a positioning hole of which the shape is matched with that of a wafer; and the mask plate positioning mechanism is used for sequentially pressing the mask plate and the wafer positioning frame on the side surface a. The base is provided with a side surface a and a plurality of side surfaces b, and when different side surfaces b are switched to serve as supporting surfaces of the base, the inclination angle of the side surface a can be adjusted, so that the exposure angles of a wafer and a mask plate can be adjusted on the premise of not changing a light